Chemical Design's Hydrogen / Methane Purification system is capable of removing HCl and moisture from a predominantly H2CH4 feed stream. The unit shown above has been operating since 1992.
- Air Plant Feed Purification
- Ammonia Removal
- Anhydrous HCL Recovery
- Argon Purification (Deoxo - Drying)
- Benzene Removal
- Butene Distillation
- Caprolactam Liquid Drying
- Carbon Dioxide Drying
- Carbon Tetrachloride Removal & Recovery
- Catalyst Regeneration
- Chlorine Purification
- Chloroform Purification
- Chlorosilane Removal
- Cryogenic Hydrogen Purification
- Cryogenic VCM Recovery
- Epitaxial (EPI) Hydrogen Vent Gas Recovery
- Ethane Drying
- Ethyl Bromide Drying
- Ethylene Drying & Purification
- Fluorocarbon Recovery System
- Helium Drying
- Heptane Drying
- Hexane Drying & Purification
- HYCO Dryer-CO2 Removal
- Hydrocarbon Purification
- Hydrocarbon Removal from Natural Gas
- Hydrogen Chloride (HCl) Purification
- Hydrogen / Methane Purification
- Hydrogen Deoxo - Drying
- Hydrogen Drying & CO2 Removal
- Hydrogen Purification
- Krypton-Xenon Purification
- Liquid Hydrocarbon Drying
- Liquid Natural Gas (LNG) Feed Purification
- Methane Removal from Liquid Oxygen
- Methyl Ethyl Ketone (MEK) / Sec- Butanol Drying
- MTBE Reactor
- Natural Gas Drying & CO2 Removal
- Natural Gas Drying & NH3 Removal
- Natural Gas Sweetener (H2S Removal)
- Neon Purification
- Nitrogen Deoxo Drying
- Nitrogen Drying
- Nitrous Oxide Production
- Olefin Drying
- Phosgene Production
- Polycrystalline Silicon Vent Gas Recovery
- Propylene Gas and Liquid Drying & Purification
- Silane Removal
- Silicon Industry Vent Gas Recovery
- Silicon Tetrachloride Removal & Recovery
- Silicone Oil Drying
- Solvent Drying
- Synthesis Gas (Syngas) Purification
- Toluene Drying
- Trichlorsilane Removal & Recovery
- Tritium Removal
- Ultra High Purity (UHP) Prepurification
- Vinyl Chloride Monomer (VCM) Removal / Recovery
- Xylene Drying